The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Nov. 24, 2015
Applicant:
Agilent Technologies, Inc., Santa Clara, CA (US);
Inventor:
Mingda Wang, Fremont, CA (US);
Assignee:
Agilent Technologies, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); H01J 49/14 (2006.01);
U.S. Cl.
CPC ...
H01J 49/147 (2013.01);
Abstract
An ion source is configured for soft electron ionization and produces a low electron-energy, yet high-intensity, electron beam. The ion source includes an electron source that produces the electron beam and transmits it into an ionization chamber. The electron beam interacts with sample material in the ionization chamber to produce an ion beam that may be transmitted to a downstream device. The electron source is configured for generating a virtual cathode upstream of the ionization chamber, which enhances the intensity of the electron beam.