The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Mar. 10, 2015
Fujifilm Corporation, Tokyo, JP;
Hirotaka Kitagawa, Haibara-gun, JP;
Yuichiro Goto, Haibara-gun, JP;
Yuichiro Enomoto, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a Cfluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; Rrepresents a Csubstituent being free from a polymerizable group; Rrepresents a hydrogen atom, Csubstituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; Rand Rmay combine with each other to form a ring.