The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Feb. 16, 2016
Applicants:
Xiamen Tianma Micro-electronics Co., Ltd., Xiamen, CN;
Tianma Micro-electronics Co., Ltd., Shenzhen, CN;
Inventors:
Assignees:
XIAMEN TIANMA MICRO-ELECTRONICS CO., LTD., Xiamen, CN;
TIANMA MICRO-ELECTRONICS CO., LTD., Shenzhen, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); H01L 21/027 (2006.01); G03F 1/76 (2012.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); G03F 1/76 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); H01L 21/0274 (2013.01);
Abstract
A reticle is provided. The reticle comprises a substrate having at least a first region and a second region; and an organic layer aligned in certain directions by an irradiation of a polarized UV light formed on a surface of the substrate. Wherein the organic layer in the first region has a first polarization direction; the organic layer in the second region has a second polarization direction; and the first polarization direction and the second polarization direction have a predetermined angle.