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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10175570 B1

PDFFull Text
Date of Patent:
Jan. 08, 2019

Filed:

Feb. 16, 2016

Reticle and fabrication method thereof, and method for fabricating patterns on a substrate

Applicants:

Xiamen Tianma Micro-electronics Co., Ltd., Xiamen, CN;

Tianma Micro-electronics Co., Ltd., Shenzhen, CN;

Inventors:

Xiaomin Liu, Xiamen, CN;

Long Zhang, Xiamen, CN;

Ting Zhou, Xiamen, CN;

Poping Shen, Xiamen, CN;

Assignees:

XIAMEN TIANMA MICRO-ELECTRONICS CO., LTD., Xiamen, CN;

TIANMA MICRO-ELECTRONICS CO., LTD., Shenzhen, CN;

Attorney:

Anova Law Group, PLLC

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.
CPC ...
G03F 1/50 (2012.01); H01L 21/027 (2006.01); G03F 1/76 (2012.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); G03F 1/76 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); H01L 21/0274 (2013.01);
Abstract

A reticle is provided. The reticle comprises a substrate having at least a first region and a second region; and an organic layer aligned in certain directions by an irradiation of a polarized UV light formed on a surface of the substrate. Wherein the organic layer in the first region has a first polarization direction; the organic layer in the second region has a second polarization direction; and the first polarization direction and the second polarization direction have a predetermined angle.

Find Patent Forward Citations

Liu, Xiaomin. (2019). Reticle and fabrication method thereof, and method for fabricating patterns on a substrate (U.S. Patent No. 10175570). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10175570

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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