The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Jul. 15, 2013
Trustees of Boston University, Boston, MA (US);
Bennett B. Goldberg, Newton, MA (US);
Thomas Bifano, Mansfield, MA (US);
Selim M. Unlu, Jamaica Plain, MA (US);
Euan Ramsay, Dublin, CA (US);
Fatih Hakan Koklu, Sunnyvale, CA (US);
Jerome Mertz, Cambridge, MA (US);
Yang Lu, Boston, MA (US);
Abdulkadir Yurt, Brighton, MA (US);
Christopher Stockbridge, Natick, MA (US);
Trustees of Boston University, Boston, MA (US);
Abstract
A system and method for correction of aberrations in a solid immersion microscopy system using a deformable mirror. A solid immersion lens is provided having a surface configured to make optical contact with a nearly planar surface of a substrate, an object to be imaged disposed on the opposite side of the substrate. A convex surface of the solid immersion lens faces an objective lens. A deformable mirror assembly, including a plurality of individually controllable actuators, receives light transmitted from the object. A control system controls in communication with the deformable mirror assembly provides individual actuation of each of the actuators of the deformable mirror to compensate or counteract the effects of aberrations.