The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2019

Filed:

Jul. 23, 2015
Applicant:

Himax Technologies Limited, Tainan, TW;

Inventors:

Yin-Dong Lu, Tainan, TW;

Han-Ching Lin, Tainan, TW;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 13/18 (2006.01); G02B 3/02 (2006.01); G02B 13/00 (2006.01); G02B 7/02 (2006.01); B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 13/0085 (2013.01); B29D 11/0073 (2013.01); B29D 11/00307 (2013.01); B29D 11/00355 (2013.01); G02B 7/022 (2013.01); G02B 13/004 (2013.01); G02B 13/006 (2013.01); G02B 13/0035 (2013.01);
Abstract

A wafer level lens system includes a target lens and a wafer level lens group. The target lens includes a first surface, a second surface, and a first fitting structure. The second surface is opposite to the first surface. The first fitting structure is disposed at the second surface. The wafer level lens group includes a first transparent plate and a second fitting structure. The first transparent plate has a third surface and a fourth surface opposite to the third surface. The second fitting structure is disposed on the third surface. The first fitting structure is fitted into the second fitting structure, and there is a space encapsulated between the second surface and the third surface.


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