The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Feb. 27, 2014
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Haruki Koshitouge, Yokohama, JP;
Daichi Okuno, Yokohama, JP;
Mitsubishi Chemical Corporation, Tokyo, JP;
Abstract
An optical film production method for suppressing air bubbles in microlenses, comprising rotating a roll die having a plurality of concave-shaped microlens transfer portions on the surface and running a substrate in the rotation direction; supplying an active energy ray-curable composition β onto a coating roll adjacent to the roll die surface, flattening the composition β, coating the flattened composition β on the roll die surface; supplying an active energy ray-curable composition α on the substrate and coating the composition α on a surface of the substrate; associating the compositions α and β between the roll die and the substrate to form a liquid pool; and irradiating a region between the roll die surface and the substrate surface with an active energy ray so the compositions α and β are sandwiched between the roll die surface and the substrate surface to cure the compositions α and β.