The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Sep. 23, 2016
Honeywell Limited, Mississauga, CA;
Johan Backstrom, North Vancouver, CA;
Michael Forbes, North Vancouver, CA;
Honeywell Limited, Mississauga, CA;
Abstract
Controlling a multiple-array, sheetmaking cross-directional process with a multivariable model predictive controller (MPC) employs a cost function incorporating a prediction horizon. The MPC provides a measurement profile target reference trajectory over the prediction horizon of the MPC cost function. Improved CD-MPC performance is achieved by employing a measurement profile target reference trajectory over the prediction horizon in the MPC cost function. A series of target profiles creates a reference trajectory to bring the cross-direction measurements smoothly from their current profile to the final target. By carefully designing the reference trajectory, the CD-MPC exhibits a good measurement response without aggressive control action. The current measurement target profile can be filtered through a first order plus deadtime process at each controller update and repeating the filter operation once for each step of the MPC prediction horizon generates a full reference trajectory for the profile.