The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Apr. 17, 2014
Polyvalor, Limited Partnership, Montreal, CA;
Jason Robert Tavares, Longueuil, CA;
Christopher Alex Dorval Dion, Montreal, CA;
Polyvalor, Limited Partnership, Montreal, CA;
Abstract
Methods for producing coatings on substrates are provided. These methods comprise the steps of introducing the substrate in a photo-initiated chemical vapor deposition reactor, introducing a gas precursor in the reactor, irradiating said gas precursor with UV radiation at a given wavelength, thereby at least partly photodissociating the gas precursor, until the coating is formed. In one method, the gas precursor is a mixture comprising carbon monoxide and hydrogen. In another method, the pressure in the react or is between about 0.75 and 1.25 atm and the gas precursor has an absorption cross section of about 5×10cm/molecule or less at said given wavelength. In another aspect, the substrate is ash.