The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Aug. 25, 2014
Toyo Kohan Co., Ltd., Chiyoda-ku, Tokyo, JP;
Yusuke Hashimoto, Kudamatsu, JP;
Teppei Kurokawa, Kudamatsu, JP;
Takashi Koshiro, Kudamatsu, JP;
Hironao Okayama, Kudamatsu, JP;
Tatsuoki Nagaishi, Osaka, JP;
Kotaro Ohki, Osaka, JP;
Genki Honda, Osaka, JP;
Toyo Kohan Co., Ltd., Tokyo, JP;
Abstract
This invention provides a method for forming an oxide layer on a metal substrate, which enables manufacture of an oxide layer with improved crystal orientation in comparison with that of the outermost layer of a metal substrate. The method for forming an oxide layer on a metal substratevia RF magnetron sputtering comprises a step of subjecting the crystal-oriented metal substrateexhibiting a c-axis orientation of 99% on its outermost layer to RF magnetron sputtering while adjusting the angle α formed by a perpendicular at a film formation positionon the metal substrateand a line from the film formation positionto a pointat which the perpendicular magnetic flux density is zero on the targetlocated at the position nearest to the film formation positionto 15 degrees or less.