The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Sep. 24, 2013
Applicants:
Frank Schnappenberger, Ingelheim, DE;
Anke Hellmich, Kahl, DE;
Thomas Koch, Kleinwallstadt, DE;
Thomas Deppisch, Aschaffenburg, DE;
Inventors:
Frank Schnappenberger, Johannesberg, DE;
Anke Hellmich, Kahl, DE;
Thomas Koch, Kleinwallstadt, DE;
Thomas Deppisch, Aschaffenburg, DE;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); H01J 37/32 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0042 (2013.01); C23C 14/544 (2013.01); H01J 37/3299 (2013.01); H01J 37/32449 (2013.01); H01J 37/32981 (2013.01);
Abstract
A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.