The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Sep. 09, 2016
University of Utah Research Foundation, Salt Lake City, UT (US);
Sandeep Negi, Salt Lake City, UT (US);
Rajmohan Bhandari, Salt Lake City, UT (US);
Mobashir Hasan Shandi, Salt Lake City, UT (US);
University of Utah Research Foundation, Salt Lake City, UT (US);
Abstract
A high aspect ratio shadow mask and a method of making and using the high aspect ratio shadow mask can provide multiple conductive trace pathways along high aspect ratio electrodes. The high aspect ratio shadow mask can include a substantially planar base layer and a plurality of hollow high aspect ratio projections extending from the substantially planar base layer. The high aspect ratio shadow mask can further include a plurality of openings along the hollow projections which define trace deposition patterns.