The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
May. 09, 2017
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Anthony J. Annunziata, Stamford, CT (US);
Armand A. Galan, New York, NY (US);
Steve Holmes, Ossining, NY (US);
Eric A. Joseph, White Plains, NY (US);
Gen P. Lauer, Yorktown Heights, NY (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Nathan P. Marchack, White Plains, NY (US);
Assignee:
Other;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 43/12 (2006.01); H01L 43/10 (2006.01); H01L 43/02 (2006.01); H01L 43/08 (2006.01); G11C 11/16 (2006.01); H01L 27/22 (2006.01);
U.S. Cl.
CPC ...
H01L 43/12 (2013.01); G03F 7/70325 (2013.01); G03F 7/70425 (2013.01); G11C 11/161 (2013.01); H01L 27/228 (2013.01); H01L 43/02 (2013.01); H01L 43/08 (2013.01); H01L 43/10 (2013.01); G11C 2211/5615 (2013.01); H01L 27/222 (2013.01);
Abstract
A method of forming a pillar includes masking a photoresist material using a reticle and a developer having a polarity opposite that of the photoresist to provide an island of photoresist material. A layer under the island of photoresist material is etched to establish a pillar defined by the island of photoresist material.