The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2019

Filed:

May. 08, 2016
Applicant:

Technion Research & Development Foundation Limited, Haifa, IL;

Inventors:

Ido Kaminer, Haifa, IL;

Maor Mutzafi, Haifa, IL;

Gal Harari, Haifa, IL;

Mordechay Segev, Haifa, IL;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/26 (2013.01); H01J 2237/1538 (2013.01); H01J 2237/2614 (2013.01);
Abstract

An electron beam shaping unit for use in electron beam column and a method for designing thereof is presented. The electron beam shaping unit is configured for affecting electron beams of high density or strong electron-electron repulsion. These 5 beams can always be modeled with multi electron wave function. The electron beam shaping unit comprises a mask unit configured for affecting propagation of electrons therethrough to thereby form a propagating electron beam having, at far field, radial shape as determined by multi-electron non-linear function being an eigen function determined by a multi-electron Hartree-Fock Hamiltonian.


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