The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Nov. 11, 2015
Samsung Electronics Co., Ltd., Suwon-si, KR;
Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;
Lae-hoon Kang, Suwon-si, KR;
Dong-hyun Kim, Seoul, KR;
Min-oh Kim, Seoul, KR;
Dong-yeob Han, Seoul, KR;
Do-sik Hwang, Seoul, KR;
Yong-sup Park, Seoul, KR;
Jong-buhm Park, Suwon-si, KR;
Jae-sung Lee, Seoul, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY, Seoul, KR;
Abstract
Provided are a method and apparatus for processing a magnetic resonance (MR) image of an object including first and second materials on a magnetic resonance imaging (MRI) apparatus by using multi-parameter mapping including applying to the object a plurality of radio frequency (RF) pulses separated by a first repetition time and a second repetition time, the first repetition time and the second repetition time being determined based on the first material and the second material; undersampling first MR signals corresponding to the first material and second MR signals corresponding to the second material in a K-space; and performing matching between the undersampled first and the undersampled second MR signals and a signal model for the multi-parameter mapping to determine attribute values corresponding to the first and the second materials at at least one point in an MR image of the object.