The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Aug. 29, 2016
Applicants:
International Business Machines Corporation, Armonk, NY (US);
University of Basel, Basel, CH;
Inventors:
Emanuel Loertscher, Bonstetten, CH;
Marcel Mayor, Basel, CH;
Gabriel Fernando Puebla Hellman, Zurich, CH;
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C23C 16/56 (2006.01); G01N 21/552 (2014.01); C23C 16/44 (2006.01); C23C 16/04 (2006.01); G03F 7/20 (2006.01); C23C 14/04 (2006.01); G03F 7/40 (2006.01); B05D 1/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/56 (2013.01); C23C 16/04 (2013.01); C23C 16/44 (2013.01); G01N 21/554 (2013.01); B05D 1/32 (2013.01); C23C 14/04 (2013.01); C23C 14/042 (2013.01); G03F 7/0002 (2013.01); G03F 7/2059 (2013.01); G03F 7/40 (2013.01);
Abstract
A method for manufacturing a gap device includes forming a template structure on a substrate, depositing an active material layer on the substrate and on the template structure, wherein the active material layer covers at least top and side surfaces of the template structure, planarizing the active material layer, and selectively removing the template structure with respect to the active material layer and the substrate.