The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2019

Filed:

Mar. 13, 2015
Applicant:

The Board of Trustees of the University of Illinois, Urbana, IL (US);

Inventors:

David N. Ruzic, Pesotum, IL (US);

Yuilun Wu, Urbana, IL (US);

Ivan Shchelkanov, Champaign, IL (US);

Jungmi Hong, Carlingford, AU;

Zihao Ouyang, Milpitas, CA (US);

Tae Seung Cho, San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/517 (2006.01); C23C 14/00 (2006.01); C23C 14/22 (2006.01); C23C 14/32 (2006.01); H05H 1/30 (2006.01); H05H 1/46 (2006.01); H05H 1/48 (2006.01);
U.S. Cl.
CPC ...
C23C 16/517 (2013.01); C23C 14/0021 (2013.01); C23C 14/228 (2013.01); C23C 14/32 (2013.01); H05H 1/30 (2013.01); H05H 1/46 (2013.01); H05H 1/48 (2013.01); H05H 2001/463 (2013.01);
Abstract

An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.


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