The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Nov. 30, 2015
Young I. Cho, Cherry Hill, NJ (US);
Alexander Fridman, Philadelphia, PA (US);
Daniel J. Cho, Wayne, PA (US);
Alexander Rabinovich, Cherry Hill, NJ (US);
Young I. Cho, Cherry Hill, NJ (US);
Alexander Fridman, Philadelphia, PA (US);
Daniel J. Cho, Wayne, PA (US);
Alexander Rabinovich, Cherry Hill, NJ (US);
DREXEL UNIVERISITY, Philadelphia, PA (US);
Abstract
A treatment system for treating water, such as produced water that is produced during hydraulic fracturing. The system employs a combination of a plasma spark discharge and an RF oscillating electric field. The plasma spark discharge and the RF oscillating electric field may be employed simultaneously or in an overlapping manner within a chamber to treat the water. The treatment system is able to kill microorganisms as well as reduce or eliminate fouling due to, for example, bicarbonates. In some embodiments, grids are employed to further enhance the heat produced by the RF oscillating electric field.