The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2019

Filed:

Jan. 18, 2018
Applicant:

Murata Manufacturing Co., Ltd., Nagaokakyo-shi, Kyoto-fu, JP;

Inventors:

Keisuke Ikeno, Nagaokakyo, JP;

Shigeru Tago, Nagaokakyo, JP;

Hirohumi Shinagawa, Nagaokakyo, JP;

Kuniaki Yosui, Nagaokakyo, JP;

Yuki Ito, Nagaokakyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 3/46 (2006.01); B32B 37/06 (2006.01); B32B 37/10 (2006.01); H01L 23/538 (2006.01); C09K 19/38 (2006.01);
U.S. Cl.
CPC ...
B32B 37/06 (2013.01); B32B 37/10 (2013.01); H05K 3/46 (2013.01); C09K 19/38 (2013.01); H01L 23/5383 (2013.01); H05K 2201/0129 (2013.01);
Abstract

A resin multilayer substrate includes insulating base materials integrated by thermocompression bonding and each including a thermoplastic resin as a main material. The insulating base materials include a first insulating base material with a first conductor pattern thereon, and a second insulating base material with a second conductor pattern thereon. The second insulating base material, an intermediate resin material layer, and the first insulating base material are stacked in this order. The intermediate resin material layer includes an intermediate region and an end region in contact with the surface on a first side of the second conductor pattern. The surface on the first side of the intermediate resin material layer is in contact with the first insulating base material, and, when seen in plan view, the first conductor pattern extends over the intermediate region and the end region.


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