The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2018

Filed:

Jul. 10, 2017
Applicant:

Japan Display Inc., Tokyo, JP;

Inventors:

Takaaki Ishikawa, Tokyo, JP;

Takaaki Kamimura, Tokyo, JP;

Noriyuki Hirata, Tokyo, JP;

Assignee:

Japan Display Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 51/56 (2006.01); C23C 14/56 (2006.01); H01L 21/67 (2006.01); C23C 14/24 (2006.01); H01L 27/32 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/56 (2013.01); C23C 14/24 (2013.01); C23C 14/568 (2013.01); H01L 21/67173 (2013.01); H01L 21/67184 (2013.01); H01L 21/67745 (2013.01); H01L 21/67748 (2013.01); H01L 21/67751 (2013.01); H01L 27/3246 (2013.01); H01L 51/0008 (2013.01); H01L 51/0021 (2013.01);
Abstract

Disclosed is a manufacturing apparatus of a light-emitting element including: a main transporting route extending in a first direction, the main transporting route comprising first and second transfer devices connected through a first transporting chamber; a sub-transporting route extending in a second direction intersecting the first direction, the sub-transporting route comprising a second transporting chamber connected to the first or second transfer device and a delivery chamber connected to the second transfer chamber; and a plurality of first treatment chambers connected to the delivery chamber. The main transporting route is configured to transfer a substrate to be treated in a horizontal state, and one of the plurality of treatment chambers is configured to hold the substrate in a vertical state during treatment.


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