The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
Aug. 07, 2015
Applicant:
SK Hynix Inc., Gyeonggi-do, KR;
Inventor:
Sang Hyuk Nam, Chungcheongbuk-do, KR;
Assignee:
SK Hynix Inc., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/764 (2006.01); H01L 27/11521 (2017.01); H01L 21/28 (2006.01); H01L 21/3213 (2006.01); H01L 21/311 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11521 (2013.01); H01L 21/02238 (2013.01); H01L 21/02381 (2013.01); H01L 21/02428 (2013.01); H01L 21/28273 (2013.01); H01L 21/28525 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01); H01L 21/764 (2013.01); H01L 29/66825 (2013.01);
Abstract
A semiconductor device includes a substrate including a plurality of active regions divided by a plurality of trenches, a plurality of tunnel insulating layer patterns formed over the active regions, a plurality of conductive film patterns formed over the tunnel insulating film patterns, a plurality of first isolation layers formed on sidewalls and bottom surfaces of the trenches, and a plurality of second isolation layers formed between the conductive film patterns.
Nam, Sang. (2018). Semiconductor device and method of manufacturing the same (U.S. Patent No. 10163918). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10163918
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile