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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10163656 B1

PDFFull Text
Expired
Date of Patent:
Dec. 25, 2018

Filed:

Oct. 22, 2014

Methods for dry etching cobalt metal using fluorine radicals

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Bhushan N. Zope, Santa Clara, CA (US);

Avgerinos V. Gelatos, Redwood City, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:

Moser Taboada

Alan Taboada

Primary Examiner:

Abul Kalam

Int. Cl.
CPC ...
H01L 21/3213 (2006.01); H01L 29/66 (2006.01); H01L 21/321 (2006.01); H01J 37/32 (2006.01); C23F 4/00 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32136 (2013.01); C23F 4/00 (2013.01); H01J 37/32082 (2013.01); H01J 37/32357 (2013.01); H01L 21/32115 (2013.01); H01L 21/7684 (2013.01); H01L 29/66545 (2013.01); H01J 2237/334 (2013.01); H01L 23/53257 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Embodiments of methods for etching cobalt metal using fluorine radicals are provided herein. In some embodiments, a method of etching a cobalt layer in a substrate processing chamber includes: forming a plasma from a process gas comprising a fluorine-containing gas; and exposing the cobalt layer to fluorine radicals from the plasma while maintaining the cobalt layer at a temperature of about 50 to about 500 degrees Celsius to etch the cobalt layer.

Find Patent Forward Citations

Zope, Bhushan. (2018). Methods for dry etching cobalt metal using fluorine radicals (U.S. Patent No. 10163656). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10163656

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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