The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2018

Filed:

Dec. 08, 2015
Applicant:

Soleras Advanced Coatings Bvba, Deinze, BE;

Inventors:

Wilmert De Bosscher, Drongen, BE;

Ivan Van De Putte, Waregem, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3405 (2013.01); H01J 37/32 (2013.01); H01J 37/32082 (2013.01); H01J 37/347 (2013.01); H01J 37/3435 (2013.01); H01J 37/3444 (2013.01);
Abstract

A device for use in a sputter system, comprising at least a first end block and a second end block positioned at opposite sides of the sputter system. The device is adapted such that a target assembly comprising at least one target tube or sputter magnetron, when mounted on the first and second end blocks, may be powered actively with RF power at both sides of the assembly, and such that the target assembly, when mounted, is not actively powered continuously with RF power simultaneously at both extremities of a target tube or sputter magnetron. An assembly comprising said device and a control unit for controlling powering of opposite sides of the target assembly by RF power such that the target assembly, when mounted, is not actively powered continuously with RF power simultaneously at both extremities of a target tube or sputter magnetron.


Find Patent Forward Citations

Loading…