The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2018

Filed:

Feb. 03, 2014
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Yan Rozenzon, San Carlos, CA (US);

Kyle Tantiwong, Livermore, CA (US);

Imad Yousif, San Jose, CA (US);

Vladimir Knyazik, Santa Clara, CA (US);

Bojenna Keating, Palo Alto, CA (US);

Samer Banna, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); C23C 16/4558 (2013.01); C23C 16/45561 (2013.01); C23C 16/45578 (2013.01); H01J 37/32082 (2013.01);
Abstract

An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.


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