The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
Jan. 19, 2015
Centre National DE LA Recherche Scientifique—cnrs, Paris, FR;
Jean-Louis Oudar, Chatenay Malabry, FR;
Sophie Bouchoule, Villejuif, FR;
Abstract
The invention relates to a method for manufacturing mirrors with saturable semiconducting absorptive material, which includes: depositing a saturable semiconducting absorptive material () onto a growth substrate () in order to form a structure; depositing at least one metal layer onto the structure such as to form a first mirror (); and depositing a heat-conductive substrate () onto the metal layer by electrodeposition through an electrically insulating mask (), allowing the selective deposition of the thermally conductive substrate, in order to predefine the perimeter of the mirrors with saturable semiconducting absorptive material.