The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2018

Filed:

Apr. 10, 2017
Applicant:

Nikon Research Corporation of America, Belmont, CA;

Inventors:

Eric Peter Goodwin, Oro Valley, AZ (US);

Zhiqiang Liu, Kawasaki, JP;

Yuki Terui, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01D 5/38 (2006.01); G02B 27/42 (2006.01); G02B 5/122 (2006.01);
U.S. Cl.
CPC ...
G02B 5/122 (2013.01); G01D 5/38 (2013.01); G02B 27/4233 (2013.01);
Abstract

An optical system configured as part of optical metrology unit used to assess the operational status of a workpiece and, in a specific case, configured as an encoder head of a lithographic exposure tool. The optical system is devoid of a stand-alone optical corner-cubes and includes, instead, a single, imperfect or frustrated cuboid of optically-isotropic material that, in operation with the diffraction grating of the workpiece, simultaneously forms four interferometric signals for measuring x-, y, and z-positions of the workpiece grating relative to the optical system. Proposed system and method solve problems of (i) structural complexity of a conventional metrology unit for use in an exposure tool, (ii) burdensome alignment of the multitude of optical prisms in the process of forming such metrology unit, and (iii) cyclic non-linear errors associated with measurements involving conventional corner-cubes-based metrology units.


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