The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
Feb. 24, 2015
Fondazione Istituto Italiano Di Tecnologia, Genoa, IT;
Roman Krahne, Genoa, IT;
Karol Miszta, Stoczek Lukowski, PL;
Andrea Toma, Genoa, IT;
Fanny Greullet, Genoa, IT;
Sergio Marras, Campomorone, IT;
Mirko Prato, Chiavari, IT;
Milena Arciniegas, Genoa, IT;
Liberato Manna, Genoa, IT;
FONDAZIONE ISTITUTO ITALIANO DI TECNOLOGIA, Genoa, IT;
Abstract
We describe a method for patterning of colloidal nanocrystals films that combines a high energy beam treatment with a step of cation exchange. The high energy irradiation causes cross-linking of the ligand molecules present at the nanocrystal surface, and the cross-linked molecules act as a mask for the subsequent cation exchange reaction. Consequently, in the following step of cation exchange, the regions that have not been exposed to beam irradiation are chemically transformed, while the exposed ones remain unchanged. This selective protection allows the design of patterns that are formed by chemically different nanocrystals, yet in a homogeneous nanocrystal film.