The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
May. 07, 2014
Wavelight Gmbh, Erlangen, DE;
Klaus Vogler, Eckental, DE;
Christof Donitzky, Eckental, DE;
Wavelight GmbH, , DE;
Abstract
Embodiments of the invention provide a method and apparatus for laser-processing a material. In the embodiments, a diffraction-limited beam of pulsed laser radiation is diffracted by a diffraction device to generate a diffracted beam. The diffracted beam is subsequently focused onto the material and is controlled in time and space to irradiate the material at a target position with radiation from a set of radiation pulses of the diffracted beam so that each radiation pulse from the set of radiation pulses is incident at the target position with a cross-sectional portion of the diffracted beam, the cross-sectional portion including a local intensity maximum of the diffracted beam. The beam cross-sectional portions of at least a subset of the pulses of the set include each a different local intensity maxi-mum. In this way, a multi-pulse application for generating a photo-disruption at a target location of the material can be implemented.