The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2018
Filed:
Jan. 02, 2018
Applicant:
Plantronics, Inc., Santa Cruz, CA (US);
Inventor:
Benjamin Alvarado Carter, Santa Cruz, CA (US);
Assignee:
Plantronics, Inc., Santa Cruz, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 3/02 (2006.01); G10K 11/175 (2006.01); G06F 3/16 (2006.01); H04R 3/12 (2006.01); H04R 29/00 (2006.01); H04N 9/802 (2006.01); H04R 1/40 (2006.01); G06F 3/0482 (2013.01);
U.S. Cl.
CPC ...
G10K 11/175 (2013.01); G06F 3/165 (2013.01); H04N 9/802 (2013.01); H04R 1/403 (2013.01); H04R 3/12 (2013.01); H04R 29/002 (2013.01); G06F 3/0482 (2013.01); G10H 2250/411 (2013.01); H04R 2430/01 (2013.01);
Abstract
Methods and apparatuses for addressing open space noise are disclosed. In one example, a system and method for masking open space noise includes outputting a noise masking sound from a plurality of balanced mode radiator loudspeakers distributed in a down-fire direction above an open space.
Carter, Benjamin. (2018). Sound masking system with improved high-frequency spatial uniformity (U.S. Patent No. 10157604). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10157604
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile