The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2018

Filed:

Oct. 07, 2014
Applicant:

Kewpie Corporation, Tokyo, JP;

Inventors:

Shunichi Fujikawa, Chofu, JO;

Yukina Abe, Chofu, JP;

Kazunori Asaoka, Chofu, JP;

Takushi Yoshida, Chofu, JP;

Assignee:

KEWPIE CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08B 37/08 (2006.01); A61K 47/36 (2006.01); C08L 5/08 (2006.01); A61Q 5/02 (2006.01); A61Q 5/12 (2006.01); A61K 8/73 (2006.01); A61Q 17/04 (2006.01); A61Q 19/00 (2006.01); A61Q 19/10 (2006.01); A61K 9/14 (2006.01); A61K 9/48 (2006.01); A23L 33/10 (2016.01);
U.S. Cl.
CPC ...
C08B 37/0072 (2013.01); A23L 33/10 (2016.08); A61K 8/735 (2013.01); A61K 9/14 (2013.01); A61K 9/4866 (2013.01); A61K 47/36 (2013.01); A61Q 5/02 (2013.01); A61Q 5/12 (2013.01); A61Q 17/04 (2013.01); A61Q 19/00 (2013.01); A61Q 19/007 (2013.01); A61Q 19/10 (2013.01); C08L 5/08 (2013.01); A23V 2002/00 (2013.01); A61Q 19/001 (2013.01);
Abstract

A method of producing a carboxymethyl-group-containing modified hyaluronic acid and/or a salt thereof includes a step of subjecting, in a water-containing solvent having a temperature of 30° C. or less, a dissolved raw material hyaluronic acid and/or a salt thereof to a reaction with a haloacetic acid and/or a salt thereof, the water-containing solvent including water or a liquid mixture of a water-soluble organic solvent and water, a ratio of the water-soluble organic solvent in the liquid mixture being 60 v/v % or less.


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