The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2018
Filed:
Mar. 01, 2012
Kenichiro Nakamatsu, Osaka, JP;
Hidekazu Hayashi, Osaka, JP;
Kiyoshi Minoura, Osaka, JP;
Akinobu Isurugi, Osaka, JP;
Kenichiro Nakamatsu, Osaka, JP;
Hidekazu Hayashi, Osaka, JP;
Kiyoshi Minoura, Osaka, JP;
Akinobu Isurugi, Osaka, JP;
SHARP KABUSHIKI KAISHA, Osaka, JP;
Abstract
A mold is disclosed, which is capable of producing a nanoimprint film without a problem of clogging of irregularities of the mold with a resin material. A method for producing the mold and a method for producing a nanoimprint film using the mold are further disclosed. In an embodiment, the mold includes: a first surface having a nanostructure including plural recesses spaced at an interval of less than 1 μm between bottom points of adjacent recesses; and at least two second surfaces substantially not having the nanostructure, wherein the first surface is coplanar with the at least two second surfaces and is positioned between two second surfaces.