Dual-gate thin film transistor and manufacturing method thereof and array substrate

Abstract

The present disclosure proposes a dual-gate thin film transistor and manufacturing method thereof and an array substrate. A manufacturing method includes: forming a first gate electrode, a gate insulating layer, a semiconductor layer, and an etch stop layer on a first substrate sequentially; forming a drain electrode, an independent electrode, and a source electrode on the exposed semiconductor layer; forming an insulating passivation layer on surfaces of the exposed etch stop layer, the drain electrode, the source electrode, and the independent electrode; and forming a second gate electrode on the insulating passivation layer in an area corresponding to the first gate electrode. The present disclosure can resolve the leakage current problem caused by the effective channel length between the source electrode and the drain electrode to improve the electrical properties of the dual-gate thin film transistor and improve its stability. The present disclosure can simplifies processes and reduce cost.