The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2018
Filed:
Aug. 18, 2015
Chunghwa Picture Tubes, Ltd., Taoyuan, TW;
Hsi-Ming Chang, Taoyuan, TW;
Yen-Yu Huang, Taoyuan, TW;
Chunghwa Picture Tubes, Ltd., Taoyuan, TW;
Abstract
A method for manufacturing a pixel structure is provided. A patterned semiconductor material layer, an insulation material layer, and a gate electrode material layer are formed in sequence on a substrate to form a stacked structure. A patterned photoresist layer is formed on the stacked structure by using a photomask. A portion of the stacked structure is removed to pattern the patterned semiconductor material layer into a patterned semiconductor layer by using the patterned photoresist layer as a mask. Another portion of the stacked structure is etched by using a portion of the patterned photoresist layer as a mask until a portion of the semiconductor layer in the stacked structure is exposed. Then, an exposed portion of the semiconductor layer is modified to increase a conductivity of the exposed portion of the semiconductor layer. Finally, the patterned photoresist layer is removed. A pixel structure manufactured by the method is provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile