The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2018

Filed:

Sep. 04, 2017
Applicant:

Toshiba Memory Corporation, Tokyo, JP;

Inventors:

Tsutomu Fujita, Yokkaichi Mie, JP;

Takanobu Ono, Kuwana Mie, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); H01L 21/268 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); B23K 26/03 (2006.01); B23K 26/08 (2014.01); B23K 26/364 (2014.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/78 (2013.01); B23K 26/032 (2013.01); B23K 26/0884 (2013.01); B23K 26/364 (2015.10); H01L 21/268 (2013.01); H01L 21/67092 (2013.01); H01L 21/67259 (2013.01); H01L 22/20 (2013.01); H01L 21/6836 (2013.01); H01L 2221/68327 (2013.01);
Abstract

According to one embodiment, a dicing method is provided. The dicing method includes detecting a first distance between a first portion of a substrate and a first substrate information detection unit. The method also includes detecting a second distance between a second portion of the substrate a second substrate information detection unit, the second portion different from the first portion. Distance information is calculated between the substrate and a processing lens, which is located farther from the second substrate information detection unit than from the first substrate information detection unit, based on the detected first distance and the detected second distance, and he substrate is irradiated with laser light from the processing lens based on the distance information.


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