The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2018
Filed:
Mar. 24, 2017
Applicant:
Raytheon Bbn Technologies Corporation, Cambridge, MA (US);
Inventor:
Mohammad Soltani, Belmont, MA (US);
Assignee:
Raytheon BBN Technologies Corporation, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/122 (2006.01); G01N 21/77 (2006.01); G02B 6/10 (2006.01); G02B 6/136 (2006.01); G01N 21/03 (2006.01); G01N 21/59 (2006.01); G02B 6/132 (2006.01); G02B 6/293 (2006.01); G02B 6/12 (2006.01);
U.S. Cl.
CPC ...
G02B 6/122 (2013.01); G01N 21/0303 (2013.01); G01N 21/59 (2013.01); G01N 21/7746 (2013.01); G02B 6/102 (2013.01); G02B 6/1223 (2013.01); G02B 6/132 (2013.01); G02B 6/136 (2013.01); G02B 6/29338 (2013.01); G01N 2201/0873 (2013.01); G02B 2006/12038 (2013.01); G02B 2006/12133 (2013.01); G02B 2006/12135 (2013.01); G02B 2006/12138 (2013.01);
Abstract
In one aspect, a photonic device includes a substrate layer comprising magnesium fluoride and an optical guiding layer disposed on the substrate layer. The optical guide layer includes silicon dioxide. The substrate layer and the optical guide layer are transparent at an ultraviolet and visible wavelength range. In another aspect, a method includes oxidizing silicon to form a silicon dioxide layer, bonding the silicon dioxide layer to magnesium fluoride, removing the silicon and performing lithography and etching of the silicon dioxide to form a photonic device.