The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2018
Filed:
Mar. 01, 2017
Applicant:
Purdue Research Foundation, West Lafayette, IN (US);
Inventors:
Sunny Chugh, West Lafayette, IN (US);
Ruchit Mehta, Hillsboro, OR (US);
Zhihong Chen, West Lafayette, IN (US);
Assignee:
Purdue Research Foundation, West Lafayette, IN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/26 (2006.01); C23C 16/505 (2006.01); C23C 16/02 (2006.01); H01J 37/32 (2006.01); H01L 29/16 (2006.01); C01B 32/182 (2017.01); C01B 32/186 (2017.01); C01B 32/184 (2017.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/26 (2013.01); C01B 32/182 (2017.08); C01B 32/184 (2017.08); C01B 32/186 (2017.08); C23C 16/0227 (2013.01); C23C 16/505 (2013.01); H01J 37/32082 (2013.01); H01L 21/0237 (2013.01); H01L 21/0242 (2013.01); H01L 21/0262 (2013.01); H01L 21/02378 (2013.01); H01L 21/02381 (2013.01); H01L 21/02395 (2013.01); H01L 21/02433 (2013.01); H01L 21/02527 (2013.01); H01L 29/1608 (2013.01);
Abstract
A graphene deposition process. The process includes the steps of placing a substrate into a deposition chamber and heating the chamber, generating radio frequency plasma at a location proximate to the substrate while flowing a precursor gas containing carbon through the plasma and over the substrate.