The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Jan. 01, 2018
Applicant:
Samsung Display Co., Ltd., Yongin, KR;
Inventor:
Young Gil Kwon, Suwon-si, KR;
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 27/32 (2006.01); H01L 51/56 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0016 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/16 (2013.01); G03F 7/2002 (2013.01); G03F 7/26 (2013.01); H01L 27/3246 (2013.01); H01L 27/3283 (2013.01); H01L 51/0013 (2013.01); H01L 51/56 (2013.01); H01L 51/5012 (2013.01); H01L 51/5056 (2013.01); H01L 51/5072 (2013.01); H01L 51/5088 (2013.01); H01L 51/5092 (2013.01); H01L 2227/323 (2013.01);
Abstract
A method of forming an organic material pattern film, the method including: forming partition walls on a first region of a first layer, the partition walls including a photosensitive compound including a resorcinarene, the resorcinarene including a perfluorocarbon group; forming a second layer including an organic material on a second region of the first layer, the second region being defined by the partition walls; removing the partition walls.