The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Nov. 09, 2017
Nanya Technology Corporation, New Taipei, TW;
NANYA TECHNOLOGY CORPORATION, New Taipei, TW;
Abstract
A method for preparing a patterned target layer is provided. A target layer is formed over a substrate. A multi-layered hard mask layer is formed over the target layer. The multi-layered hard mask layer includes a first hard mask layer over the target layer, a second hard mask layer between the target layer and the first hard mask layer, and a third hard mask layer between the target layer and the second hard mask layer, wherein a material of the second hard mask layer is different from a material of the first hard mask layer and a material of the third hard mask layer. The multi-layered hard mask layer is used as a hard mask layer to prepare a fine pattern on the target layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile