The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Jul. 08, 2016
Graduate School AT Shenzhen, Tsinghua University, Shenzhen, Guangdong, CN;
Qian Zhou, Guangdong, CN;
Kai Ni, Guangdong, CN;
Rui Tian, Guangdong, CN;
Jinchao Pang, Guangdong, CN;
Mingfei Xu, Guangdong, CN;
Hao Dong, Guangdong, CN;
Jinchao Zhang, Guangdong, CN;
GRADUATE SCHOOL AT SHENZHEN, TSINGHUA UNIVERSITY, Shenzhen, Guangdong, CN;
Abstract
The invention provides an exposure method of a holographic grating and an exposure light path. The exposure method includes: (1) determining initial positions (C, D) of the two exposure light sources (S, S); (2) calculating imaging quality parameters of the grating; (3) setting a compensating mirror (A) in the initial light path; (4) adjusting a position of the exposure light source (S) to a new position (D) according to a position of the compensating mirror (A); (5) calculating imaging quality parameters of the grating; (6) judging whether the imaging quality parameters in the step (5) and the imaging quality parameters in the step (2) are equal, and if yes, using the new position (D) as a final position of the exposure light source (S). The exposure method and exposure light path may effectively solve a problem of a much too close distance between exposure light sources.