The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Mar. 30, 2015
Chevron U.s.a. Inc., San Ramon, CA (US);
Haijing Wang, Sugar Land, TX (US);
Scott Jeffrey Seltzer, Houston, TX (US);
Boqin Sun, Houston, TX (US);
CHEVRON U.S.A. INC., San Ramon, CA (US);
Abstract
A disclosed method for characterizing gas adsorption on a rock sample includes: measuring a nuclear magnetic resonance (NMR) response of the rock as a function of surrounding gas pressure along an isotherm; transforming the NMR response to obtain a Langmuir pressure distribution of gas adsorption on the rock sample; and displaying the Langmuir pressure distribution. The Langmuir pressure distribution may be shown in one dimension (e.g., contribution to signal response versus Langmuir pressure), or may be combined with additional pressure-dependencies such as spin-lattice relaxation time (T), spin-spin relaxation time (T), and chemical shift (δ) to form a multi-dimensional distribution. The method can further include: identifying peaks in the Langmuir pressure distribution; and associating a gas storage mechanism and capacity with each peak. It may still further include: exposing the rock sample to a treatment fluid to obtain an altered sample; repeating said measuring and transforming operations with the altered sample; and comparing the Langmuir pressure distributions to determine effects of the treatment.