The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2018

Filed:

Jun. 23, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Hideki Matsumoto, Utsunomiya, JP;

Fumio Sakai, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 43/02 (2006.01); B29C 59/02 (2006.01); G03F 7/00 (2006.01); B29C 37/00 (2006.01); B29C 43/56 (2006.01); B29L 31/00 (2006.01);
U.S. Cl.
CPC ...
B29C 37/0003 (2013.01); B29C 43/021 (2013.01); B29C 43/56 (2013.01); B29C 59/02 (2013.01); B29C 59/026 (2013.01); G03F 7/0002 (2013.01); B29C 2059/023 (2013.01); B29L 2031/757 (2013.01);
Abstract

An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.


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