The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Nov. 11, 2015
Applicant:
Invista North America S.a R.l., Wilmington, DE (US);
Inventors:
Joan Fraga-Dubreuil, Middlesbrough, GB;
Vinay Medhekar, Beaumont, TX (US);
John A. Turner, Middlesbrough, GB;
Keith Whiston, Darlington, GB;
Assignee:
INVISTA NORTH AMERICA S.A R.L., Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 27/043 (2006.01); B01J 23/755 (2006.01); B01J 31/18 (2006.01); B01J 35/00 (2006.01); B01J 35/10 (2006.01); C07F 9/145 (2006.01); C07F 15/04 (2006.01);
U.S. Cl.
CPC ...
B01J 23/755 (2013.01); B01J 31/185 (2013.01); B01J 31/1845 (2013.01); B01J 35/006 (2013.01); B01J 35/1009 (2013.01); C07F 9/145 (2013.01); C07F 15/04 (2013.01); B01J 35/002 (2013.01); B01J 2231/322 (2013.01); B01J 2531/007 (2013.01); B01J 2531/847 (2013.01);
Abstract
Disclosed are nickel-containing complexation precursors having high complexation activity for bidentate phosphite ligands. Also disclosed are methods of making the complexation precursors. The disclosed method of generating the nickel-containing complexation precursor includes including contacting a nickel starting material with a reductant under conditions sufficient to generate a nickel-containing complexation precursor having at least about 1,500 ppmw sulfur in the form of sulfide.