The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Aug. 29, 2017
Korea Institute of Energy Research, Daejeon, KR;
Ho-Jung Ryu, Daejeon, KR;
Dal-hee Bae, Sejong-si, KR;
Sung-ho Jo, Daejeon, KR;
Seung-yong Lee, Daejeon, KR;
Chang-keun Yi, Daejeon, KR;
Gyoung-tae Jin, Daejeon, KR;
Do-won Shun, Daejeon, KR;
Jae-hyeon Park, Daejeon, KR;
Young Cheol Park, Daejeon, KR;
Jong-ho Moon, Daejeon, KR;
Hyo Jin Lee, Daejeon, KR;
Do Yeon Lee, Seoul, KR;
Dong-ho Lee, Daejeon, KR;
Jeom In Baek, Daejeon, KR;
KOREA INSTITUTE OF ENERGY RESEARCH, Daejeon, KR;
Abstract
The present invention relates to a fluidized bed system having a sparger capable of minimizing a blockage by solids and controlling method thereof. And, more specifically, the present invention relates to a fluidized bed system having a sparger capable of minimizing a blockage by solids comprising a fluidized bed reactor to store a solid layer with a certain height and to fluidize the solid layer by using fluidization gases; a sparger having a pipe shape submerged in the solid layer and having a plurality of gas-discharging holes to spray fluidization gases onto the solid layer; and a gas-supplying line having its one end contacting a gas-supplying source and the other end connected to the sparger, wherein fluidization gases are introduced through the gas-supplying line into the sparger by driving the gas-supplying source, the fluidization gases are sprayed through the gas-discharging holes onto the solid layer, the gas-supplying source is placed higher than the sparger and the height difference (H) between the gas-supplying source and the sparger is greater than the height of the solid layer.