The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2018
Filed:
Feb. 03, 2017
Screen Holdings Co., Ltd., Kyoto, JP;
Toshihito Morioka, Kyoto, JP;
SCREEN Holdings Co., Ltd., , JP;
Abstract
A substrate processing apparatus includes a washing liquid supply unit which supplies a washing liquid to a washing liquid discharge port which is open in the outer circumferential surface of a body, a rotation unit which relatively rotates the opposing member and the body around a rotational axis passing through the central portion of the upper surface of the substrate and a washing control unit which controls the washing liquid supply unit and the rotation unit so as to wash the cylindrical gap, where the washing control unit performs a rotation step of controlling the rotation unit so as to relatively rotate the opposing member and the body and a washing liquid discharging step of controlling the washing liquid supply unit so as to discharge a washing liquid from the washing liquid discharge port simultaneously with the rotation step.