The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Jan. 30, 2017
Applicant:

Dongfang Jingyuan Electron Limited, Beijing, CN;

Inventors:

Zongchang Yu, San Jose, CA (US);

Jie Lin, San Jose, CA (US);

Zhaoli Zhang, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5009 (2013.01); G06F 17/5081 (2013.01);
Abstract

Methods and systems for defect prediction are provided. The method includes receiving feature data of an integrated circuit (IC) and process condition data of a production process associated with the IC, and determining a care area associated with the IC using the feature data, the process condition data, and a defect prediction technique, wherein the care area includes a potential defect and is inspected by a high-resolution inspection system. Based on the provided methods and systems, care areas can be generated incorporating actual process conditions when the inspected IC is being manufactured, and fast and high-resolution IC defect inspection systems can be implemented.


Find Patent Forward Citations

Loading…