The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Mar. 31, 2016
Applicant:

Fujitsu Limited, Kawasaki-shi, Kanagawa, JP;

Inventors:

Ajay Chander, San Francisco, CA (US);

Sanam Mirzazad Barijough, Mountain View, CA (US);

Assignee:

FUJITSU LIMITED, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 3/0482 (2013.01); G06F 3/0481 (2013.01); G06Q 10/10 (2012.01); G16H 50/30 (2018.01); G06F 19/00 (2018.01);
U.S. Cl.
CPC ...
G06F 3/0482 (2013.01); G06F 3/04817 (2013.01); G06F 19/00 (2013.01); G06Q 10/10 (2013.01); G16H 50/30 (2018.01);
Abstract

A method includes receiving input data pertaining to a user. Based on the input data, the method includes rendering a graphical user interface (GUI) that includes an initial icon arrangement (arrangement) presentable in a virtual environment. The initial icon arrangement includes a set of icons representative of portions of an overall time period represented by the initial icon arrangement. The method includes determining whether a portion of the input data is representable in the initial icon arrangement. If so, the method includes quantifying the second portion of the input data with a target and a timeframe, associating the target and the timeframe with the second portion of the input data, modifying icons in the arrangement that correspond to the timeframe to represent the target, rendering the modified icons as an opportunity layer on the arrangement, and displaying the arrangement with the opportunity layer in the virtual environment.


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