The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2018
Filed:
Jan. 05, 2015
Dexerials Corporation, Tokyo, JP;
Yutaka Wada, Utsunomiya, JP;
Mitsuo Arima, Sendai, JP;
DEXERIALS CORPORATION, Tokyo, JP;
Abstract
A method for designing anti-reflective structure in which plurality of nanostructures formed of projected portions on substrate surface are provided at intervals equal to or less than visible light wavelength, in order to reduce chroma (√(a+b)) of reflected light with respect to white light to as close to zero as possible, average height of nanostructures from flat portion of substrate surface is 180 nm or greater and 290 nm or less; and filling rate of nanostructures, i.e., ratio of area of bottom surface of nanostructures to area of substrate surface in plan view of anti-reflective structure is defined, in terms of relationship between filling rate and chroma (√(a+b)) of reflected light from anti-reflective structure with respect to white light, so as to fall within range of ±5% of filling rate at which chroma takes on minimum value.