The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

May. 22, 2017
Applicant:

Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v., Munich, DE;

Inventors:

Wladimir Tschekalinskij, Nuremberg, DE;

Stephan Junger, Bubenreuth, DE;

Nanko Verwaal, Herzogenaurach, DE;

Norbert Weber, Weissenohe, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/25 (2006.01); G01N 21/27 (2006.01); G01J 3/51 (2006.01); G01J 3/02 (2006.01); G01J 3/28 (2006.01);
U.S. Cl.
CPC ...
G01N 21/255 (2013.01); G01J 3/0289 (2013.01); G01J 3/2803 (2013.01); G01J 3/513 (2013.01); G01N 21/251 (2013.01); G01N 21/27 (2013.01);
Abstract

The present invention relates to a color sensor having at least one photosensitive element, in front of which a layer stack of dielectric layers and structured metal layers is constructed, and at least one color filter, through which optical radiation incident on a light input side of the color sensor is filtered before it reaches a photosensitive surface of the photosensitive element. In the suggested color sensor, an array of angle-selective passageways is provided for the optical radiation between the light input side and the photosensitive surface, and each passageway only allows parts of the optical radiation incident on the light input side of the color sensor within a limited angle of incidence range relative to an axis extending perpendicularly to the colour filter to pass through to the photosensitive surface. When the color sensor is manufactured with semiconductor technology, it enables the angle-selective structures to be integrated in the CMOS layer stack. In this way, ultra-flat color sensors can be made.


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