The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Aug. 22, 2013
Applicant:

Vermes Microdispensing Gmbh, Otterfing, DE;

Inventors:

Mario Fliess, Munich, DE;

Juergen Staedtler, Feldkirchen-Westerham, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F15D 1/08 (2006.01); B05C 5/02 (2006.01); G01F 11/02 (2006.01);
U.S. Cl.
CPC ...
F15D 1/08 (2013.01); B05C 5/0225 (2013.01); G01F 11/021 (2013.01); Y10T 29/49826 (2015.01);
Abstract

The invention describes a dosing system () for a shear-thinning or thixotropic liquid to viscous dosing material. It comprises a nozzle () with a closure channel (), within which a closure element () is controlled during operation by means of an automatic control unit () in an ejection direction (E) and/or retraction direction (R). To this end, the closure channel () is realized in at least one cross-section perpendicular to the ejection direction (E) and/or retraction direction (R) relative to the cross-section of the closure element () in the same plane to give an aperture gap () between the outer surface (S) of the closure element () and the inner surface (S) of the closure channel (), which aperture gap () is shaped and/or dimensioned to form an outlet channel, at least in places, for the dosing material. The control unit () is realized to generate control signals (SS, SS) for different movements of the closure element () in at least two movement modes (M, M, M, M, M), whereby it deliberately moves the closure element () during operation in order to reduce the viscosity of the dosing material in at least a region of the aperture gap (). The invention further describes a method of manufacturing such a dosing system (), and a dosing method that can be carried out with the dosing system ().


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