The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Oct. 14, 2016
Applicant:

Saint-gobain Adfors Canada, Ltd., Grand Island, NY (US);

Inventors:

Sahas Rathi, Westborough, MA (US);

Jia-Mei Soon, L'hay les Roses, FR;

Jackson A. Ivey, Worcester, MA (US);

Nancy E. Brown, New Braintree, MA (US);

Pascal Nael, Aubervilliers, FR;

Assignee:

SAINT-GOBAIN ADFORS CANADA, LTD., Grand Island, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
D06M 11/84 (2006.01); D06M 11/83 (2006.01); C23C 14/20 (2006.01); G02B 5/02 (2006.01); C03C 25/10 (2018.01); D06M 101/22 (2006.01); D06N 3/00 (2006.01); D06N 3/06 (2006.01);
U.S. Cl.
CPC ...
D06M 11/83 (2013.01); C03C 25/10 (2013.01); C23C 14/20 (2013.01); G02B 5/0215 (2013.01); G02B 5/0268 (2013.01); G02B 5/0284 (2013.01); D06M 2101/22 (2013.01); D06N 3/0022 (2013.01); D06N 3/06 (2013.01); D06N 2209/0876 (2013.01); D06N 2211/122 (2013.01); D06N 2211/125 (2013.01);
Abstract

A screen includes a mesh substrate having an openness of greater than 30% when viewed at 0° incidence, the mesh substrate having a first major surface and a second major surface, the first major surface including a first coating, the first major surface having a first reflectance value, wherein the first reflectance value has an average value of greater than about 10% as measured by an EN410 standard and a diffuse reflection profile at all viewing angles from −89° to 89°, excluding an angle of direct illumination as measured by a scattering distribution function technique using a Goniometer, wherein the diffuse reflection profile provides a reduction in view through the mesh substrate when viewed from −89° to 89°.


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