The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Mar. 15, 2013
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Takayuki Nozaki, Tokyo, JP;

Guangbin Zhou, Tokyo, JP;

Masaharu Kiyama, Tokyo, JP;

Ryota Nakajima, Tokyo, JP;

Shizu Matsuoka, Tokyo, JP;

Taku Nakamura, Tokyo, JP;

Masakazu Sugaya, Tokyo, JP;

Koichi Terada, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/00 (2006.01); B01L 1/00 (2006.01); C12M 3/00 (2006.01); C12M 1/34 (2006.01);
U.S. Cl.
CPC ...
C12M 21/08 (2013.01); C12M 23/50 (2013.01); C12M 23/58 (2013.01); C12M 29/00 (2013.01); C12M 41/14 (2013.01); C12M 41/36 (2013.01);
Abstract

An automatic culture device which employs closed-system culture vessels and in which, when a passage part () and a rotational valve mechanism () are configured, the multiple culture vessels in a culture vessel part () can be rendered equal in liquid-feeding conditions by, for example, regulating the length of each passage. As a result, the evenness in quality of cells incubated in the multiple culture vessels is rendered possible. Furthermore, by providing a mechanism which enables a user to normally set passages in the device, the evenness in quality of the cells is rendered possible likewise.


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